PL-I Opening Ceremony / Plenary Session I |
November 17(Wed), 13:00~14:20 KST, 평창홀
좌장 : 이진균(인하대)
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PL-I-1
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조직위원장 개회사
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PL-I-2
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한국광학회 회장 축사
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PL-I-3
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학술대회 10주년 기념사
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PL-I-4
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EUV pellicle with 30 years of lithography life
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W-EU-I EUV Lithography I |
November 17(Wed), 14:40~16:10 KST, 평창홀 1
좌장 : 안진호(한양대)
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W-EU-I-1
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Non-uniformity at the nanoscale - chemical stochastic effects in high resolution photoresists for lithography
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W-EU-I-2
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R&D Activities of EUV Lithography at NewSUBARU Synchrotron Light Facility
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W-EU-I-3
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FST's EUVL Infrastructure Tools Development: Meaning, Status, & Beyond
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W-EU-II EUV Lithography II |
November 17(Wed), 16:30~18:00 KST, 평창홀 1
좌장 : 이상설(포항공대 가속기연구소)
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W-EU-II-1
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EUV용 blank/pellicle의 현황 및 개발 방향
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W-EU-II-2
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Actinic tools using EUV source for EUV lithography
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W-EU-II-3
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EUV photo-induced chemical reaction in hydrogen silsesquioxane
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W-EU-II-4
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회절광 특성 최적화를 통한 극자외선 노광공정용 마스크 이미징 성능 향상
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W-AL-I Alternative Lithography I |
November 17(Wed), 14:40~16:10 KST, 평창홀 2
좌장 : 박준용(금오공대)
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W-AL-I-1
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A new top-down lithography with high-aspect ratio and high-resolution
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W-AL-I-2
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Pattern transfer of large-scale thin membranes with controllable self-delamination interface for integrated functional systems
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W-AL-I-3
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Lithography technique to build-up protein nanostructures
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W-AL-II Alternative Lithography II |
November 17(Wed), 16:30~18:00 KST, 평창홀 2
좌장 : 전석우(KAIST)
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W-AL-II-1
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Nanoimprint for meta-surface
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W-AL-II-2
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Builing up nanostructures by DNA-mediated colloidal self-assembly
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W-AL-II-3
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Development of new optical components through proximity-field nanopatterning
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W-NF-I Nano Fabrication for Next Generation Optical Devices I |
November 17(Wed), 14:40~16:10 KST, 평창홀 3
좌장 : 김명기(고려대)
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W-NF-I-1
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Rapid Prototyping of Optical Fourier Surfaces/Volumes for AR/VR Displays
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W-NF-I-2
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Near-field probing of image polaritons in van der Waals crystals
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W-NF-I-3
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온 칩 광공진기 기반 광 주파수 빗 발생
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W-NF-II Nano Fabrication for Next Generation Optical Devices II |
November 17(Wed), 16:30~18:00 KST, 평창홀 3
좌장 : 이승우(고려대)
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W-NF-II-1
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Printable Nanolasers
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W-NF-II-2
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Probing long-range vibrational modes using metal nanogaps
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W-NF-II-3
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Single-Step Particle-Embedded-Resin Nanoprinting for Scalable Optical Metasurfaces
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PL-II Plenary Session II |
November 18(Thu), 10:00-11:30 KST, 평창홀
좌장 : 이상설(포항공대 가속기연구소)
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PL-II-1
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EUV-IUCC 센터장/프로그램위원장 환영사
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PL-II-2
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Extending semiconductor patterning into the next decade
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PL-II-3
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3 decades in lithography – the ever moving brick wall
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T-PM-I Patterning Materials I |
November 18(Thu), 13:00~14:30 KST, 평창홀 1
좌장 : 이진균(인하대)
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T-PM-I-1
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Quantum manipulated metal oxo cluster networks for EUV resist
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T-PM-I-2
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Continuous Flow Polymerization for Synthesis of Copolymer Resins Utilizable in Chemically Amplified Resists
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T-PM-I-3
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Aligned Non-oxidized Graphene Aerogel as Efficient Support for Enhanced Oxygen Evolution Reaction of Copper Oxide Nanoparticles
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T-PM-I-4
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Hard and flexible nanocomposite based on three-dimensional oxide nanostructures fabricated by Proximity-field nanoPatterning (PnP).
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T-PM-II Patterning Materials II |
November 18(Thu), 14:50~16:50 KST, 평창홀 1
좌장 : 김명웅(인하대)
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T-PM-II-1
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ArF Immersion exposure interference pattern analysis and application
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T-PM-II-2
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불소화 유기소재 기반 극자외선 레지스트 개발 연구
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T-PM-II-3
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Perfect optical Fourier surfaces through holographic inscription
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T-PM-II-4
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Stable and highly efficient HOEs by using organic-inorganic hybrid interpenetrating networks
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T-PM-II-5
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Alignment Methods of Liquid Crystal Elastomers and Their Actuations
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T-PM-II-6
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Fabrication of 3D Nanostructured NiMo Electrocatalysts for the Hydrogen Evolution Reaction in Alkaline Solution
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T-LO-I Layout Optimization and Computational Lithography I |
November 18(Thu), 13:00~14:30 KST, 평창홀 2
좌장 : 양현조(ASML)
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T-LO-I-1
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GPU-Accelerated Computational Lithography: ILT – Its Requirements and Implementations
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T-LO-I-2
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Stochastic modeling and prediction
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T-LO-I-3
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Smart process control for semiconductor manufacturing
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T-LO-II Layout Optimization and Computational Lithography II |
November 18(Thu), 14:50~16:50 KST, 평창홀 2
좌장 : 양현조(ASML)
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T-LO-II-1
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기계학습 기반을 활용한 최신기술 노드에서의 수율 향상 방법에 대한 제안
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T-LO-II-2
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A Study on the Importance of Memory Device OPC Model Accuracy and Methods for Improvement
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T-LO-II-3
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고해상도 printed circuit board 제작을 위한 최적의 i-line 노광 해상도 향상 기술 적용
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T-LO-II-4
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Effects of Particles on Extreme Ultraviolet Pellicles: Computational Study
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T-LO-II-5
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Test Pattern Clustering and Synthesis for Lithography Modeling
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T-LO-II-6
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CNN-based Optimization of Resist model with Free-form Kernels
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T-MI-I Advanced Metrology and Inspection I |
November 18(Thu), 13:00~14:30 KST, 평창홀 3
좌장 : 이명준(삼성전자)
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T-MI-I-1
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The Importance of massive measurement in semiconductor device development
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T-MI-I-2
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Metrology Concepts for EUV Tool and Process Monitoring
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T-MI-I-3
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Computational Phase Imaging
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T-MI-II Advanced Metrology and Inspection II |
November 18(Thu), 14:50~16:50 KST, 평창홀 3
좌장 : 이명준(삼성전자)
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T-MI-II-1
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Material-specific super-resolution imaging of nano-patterned wafer
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T-MI-II-2
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EUV phase-sensitive imaging reflectometry for compositional mapping of nanostructures
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T-MI-II-3
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Next generation OCD metrology solution for the advanced semiconductor devices
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T-MI-II-4
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Ellipsometry 기반 Metrology/Inspection 장비 및 기술 개발 동향
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PL-III Best Student Paper Awards / Closing Ceremony |
November 18(Thu), 17:00~17:20 KST, 평창홀
좌장 : 김성환(아주대)
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PL-III-1
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학생논문상 심사평 및 시상
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PL-III-2
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조직위원장 폐회사
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PS1 EUV Lithography |
PS1-1
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MoSi2 단일막 EUV 펠리클의 광학적/열적 특성 평가
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PS1-2
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펠리클 주름에 의한 반사도 변화와 패턴 임계치수에 미치는 영향 연구
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PS1-3
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극자외선 펠리클의 처짐에 대한 잔류 응력의 영향
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PS1-4
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고 개구수 극 자외선용 phase shift mask 를 위한 최적의 phase shift 와 reflectance
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PS1-5
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Dose 량 및 감광제를 포함한 박막층에 따른 극자외선 노광에 의한 웨이퍼의 열적 변형
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PS1-6
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오염 물질 충돌에 의한 EUV pellicle 의 기계적 안정성 평가
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PS1-7
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Development of one-stop evaluation system for extreme ultraviolet photoresist using synchrotron radiation
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PS1-8
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EUV lighting technology using carbon nanotube-based cold cathode electron beam
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PS2 Patterning Materials |
PS2-1
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Highly Fluorinated Alternating Copolymers as EUV Resist Candidates
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PS3 Nano Fabrication for Next Generation Optical Devices |
PS3-1
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Fabrication of nanoring array by angle E-beam evaporation and ICP-RIE
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PS3-2
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Wafer-scale large-area fabrication for multi-sized nano-disk-array visible camouflage IR stealth MSM meta-surface device by BARC-based DUV-lithography-compatible oxygen dry-etch lift-off method
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PS3-3
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Metal-Semiconductor-Metal Metasurface for the Multispectral Camouflage from Visible to Infrared Range
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PS4 Alternative Lithography |
PS4-1
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Microfluidics for monodisperse droplets of highly viscous fluids
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PS4-2
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DNA-based nanodevices through algorithmic self-assembly
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PS4-3
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Implementation of fine patterning using ALD and nano-imprint lithography
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PS4-4
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Eco-friendly deep ultraviolet photolithography using silk photoresist
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PS4-5
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Nanoimprinted PVA nanopattern for humidity sensor application
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PS4-6
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Optimization method for enhancing precision in DMD-based maskless lithography
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PS5 Advanced Metrology and Inspection |
PS5-1
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다층-박막구조 OLED 패널 내부 이물 높이 비파괴적 측정 연구
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PS5-10
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차등진공 시스템과 초소형 전자칼럼의 전자방출원 연구
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PS5-11
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플렌옵틱 이미지 축해상도 모델링 및 경향성 분석
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PS5-2
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고체내에서의 고차조화파 위상 정합을 이용한 극자외선 빔 제어 Ultraviolet Beam Control using Phase Matching of High Harmonic Generation in Solids
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PS5-3
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Development of autofocus microscope system that responds to changes in object height in real time
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PS5-4
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플렌옵틱 이미지 모델링 및 측정 비교 분석
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PS5-5
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반도체 결함 검사 장비용 193nm High-NA 대물렌즈 광학 설계
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PS5-6
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Temporal characterization of plasmonic near-field in a gold nanostructure array driven by femtosecond laser pulses
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PS5-7
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Simulation and fabrication of high-resolution electron beam with carbon nanotube electron sources
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PS5-8
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Robustness enhancement of dynamic spectroscopic ellipsometry
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PS5-9
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Model-less TSOM 적용 OLED 입자 결함 분류 및 높이 측정
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PS6 Lasers for Lithography |
PS6-1
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미세 PR 패터닝을 위한 비대칭 접힘 티타늄 사파이어 레이저의 모드 잠금된 극초단 펄스 발생 연구
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PS6-2
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EUV 발생용 고출력 대구경 광섬유 레이저 매질로 개발된 역 계단/언덕 혼합형 굴절 구조의 광섬유 벤딩 손실 분석 연구
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PS7 Sensors |
PS7-1
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패터닝 된 이황화 몰리브덴 나노 필름을 이용한 웨어러블 습도 센서 연구
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PS7-2
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패터닝 된 이차원 이황화 몰리브덴 박막을 이용한 광섬유 센서 및 이의 호흡 모니터링 응용 연구
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PS8 Stealth Technology |
PS8-1
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Optically transparent bi-stealth frequency selective surface absorber
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PS9 Advanced Etch Technology |
PS9-1
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Radial plasma profile modification of VHF/LF 2f-CCP dry etchers by electrode geometric design variation
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