2021 차세대 리소그래피 학술대회

2021 Next Generation Lithography Conference

Nov. 17-18, 2021
Alpensia Convention Center, Pyeong Chang (Online / Offline Hybrid)
함께하는 행사 : ASML TechTalk (Nov. 19, 2021)
Session Track
Full Program
November 18(Thu)
T-MI-I
Advanced Metrology and Inspection I
평창홀 3,
13:00~14:30 KST
좌장: 이명준(삼성전자)
온라인 발표장 바로가기 (Live Presentation)
T-MI-I-1
13:00~13:30
The Importance of massive measurement in semiconductor device development
*손영훈, 안재형, 류성윤, 박영환 (삼성전자)
Abstract
T-MI-I-2
13:30~14:00
Metrology Concepts for EUV Tool and Process Monitoring
*Daniel Schmidt (IBM Research)
Abstract
T-MI-I-3
14:00~14:30
Computational Phase Imaging
*Lei Tian (Boston University)
Abstract