2021 차세대 리소그래피 학술대회

2021 Next Generation Lithography Conference

Nov. 17-18, 2021
Alpensia Convention Center, Pyeong Chang (Online / Offline Hybrid)
함께하는 행사 : ASML TechTalk (Nov. 19, 2021)
Session Track
Full Program
November 18(Thu)
T-MI-II
Advanced Metrology and Inspection II
평창홀 3,
14:50~16:50 KST
좌장: 이명준(삼성전자)
온라인 발표장 바로가기 (Live Presentation)
T-MI-II-1
14:50~15:20
Material-specific super-resolution imaging of nano-patterned wafer 
*김두리 (한양대학교)
Abstract
T-MI-II-2
15:20~15:50
EUV phase-sensitive imaging reflectometry for compositional mapping of nanostructures
*Yuka Esashi (University of Colorado, JILA)
Abstract
T-MI-II-3
15:50~16:20
Next generation OCD metrology solution for the advanced semiconductor devices
*김욱래 (삼성전자)
Abstract
T-MI-II-4
16:20~16:50
Ellipsometry 기반 Metrology/Inspection 장비 및 기술 개발 동향
*김 상열 (아주대학교, 엘립소테크놀러지)
Abstract