2021 차세대 리소그래피 학술대회

2021 Next Generation Lithography Conference

Nov. 17-18, 2021
Alpensia Convention Center, Pyeong Chang (Online / Offline Hybrid)
함께하는 행사 : ASML TechTalk (Nov. 19, 2021)
Session Track
Full Program
November 18(Thu)
T-PM-I
Patterning Materials I
평창홀 1,
13:00~14:30 KST
좌장: 이진균(인하대)
온라인 발표장 바로가기 (Live Presentation)
T-PM-I-1
13:00~13:30
Quantum manipulated metal oxo cluster networks for EUV resist
*정현담 (전남대학교)
Abstract
T-PM-I-2
13:30~14:00
Continuous Flow Polymerization for Synthesis of Copolymer Resins Utilizable in Chemically Amplified Resists
*Myungwoong Kim (Inha University)
Abstract
T-PM-I-3
14:00~14:15
Aligned Non-oxidized Graphene Aerogel as Efficient Support for Enhanced Oxygen Evolution Reaction of Copper Oxide Nanoparticles
Jin Kim, Anand Prakash Tiwari, Caiyan Qin, *Seokwoo Jeon (KAIST)
Abstract
T-PM-I-4
14:15~14:30
Hard and flexible nanocomposite based on three-dimensional oxide nanostructures fabricated by Proximity-field nanoPatterning (PnP). 
배광민, *전석우 (한국과학기술원)
Abstract