2021 차세대 리소그래피 학술대회

2021 Next Generation Lithography Conference

Nov. 17-18, 2021
Alpensia Convention Center, Pyeong Chang (Online / Offline Hybrid)
함께하는 행사 : ASML TechTalk (Nov. 19, 2021)
Call for Papers
분야 세부분야
EUV Lithography EUV scanner, EUV tools, EUV mask, EUV pellicle, EUV OPC, EUV patterning material
Patterning Materials E-beam and EUV resist, Photoresist for optical lithography, Materials for alternative lithography, Patterning materials for displays, Photopatternable functional materials
Nano Fabrication for Next Generation Optical Devices Nanoprinting for optical metasurfaces, Next generation AR/VR optics, Near-field probing, Frequency comb generation on a chip, Plasmonic nanogaps, Printable Nanolasers
Alternative Lithography 3D Patterning, Imprinting, 3D Printing, Self-assembly, Non-conventional lithography
Layout Optimization / Computational Lithography DTCO(Design Technology Co-Optimization), DFM(Design for Manufacturing), Design for multi-patterning and pattern decomposition, OPC(Optical Proximity Correction), SMO(Source Mask Optimization), ILT(Inverse Lithography Technology), Modeling for process, Mask and defect control, Deep learning and machine learning based process, OPC and mask optimization
Advanced Metrology / Inspection Optical inspection, Scatterometry, Interference microscopy, SEM, AFM, Holography, EUV/X-ray inspection, Advanced process control, Machine learning, Overlay metrology, Computational imaging, Computational metrology
Other Topics Applications and Related Emerging Topics