분야 |
세부분야 |
EUV Lithography |
EUV scanner, EUV tools, EUV mask, EUV pellicle, EUV OPC, EUV patterning material |
Patterning Materials |
E-beam and EUV resist, Photoresist for optical lithography, Materials for alternative lithography, Patterning materials for displays, Photopatternable functional materials |
Nano Fabrication for Next Generation Optical Devices |
Nanoprinting for optical metasurfaces, Next generation AR/VR optics, Near-field probing, Frequency comb generation on a chip, Plasmonic nanogaps, Printable Nanolasers |
Alternative Lithography |
3D Patterning, Imprinting, 3D Printing, Self-assembly, Non-conventional lithography |
Layout Optimization / Computational Lithography |
DTCO(Design Technology Co-Optimization), DFM(Design for Manufacturing), Design for multi-patterning and pattern decomposition, OPC(Optical Proximity Correction), SMO(Source Mask Optimization), ILT(Inverse Lithography Technology), Modeling for process, Mask and defect control, Deep learning and machine learning based process, OPC and mask optimization |
Advanced Metrology / Inspection |
Optical inspection, Scatterometry, Interference microscopy, SEM, AFM, Holography, EUV/X-ray inspection, Advanced process control, Machine learning, Overlay metrology, Computational imaging, Computational metrology |
Other Topics |
Applications and Related Emerging Topics |