2021 차세대 리소그래피 학술대회

2021 Next Generation Lithography Conference

Nov. 17-18, 2021
Alpensia Convention Center, Pyeong Chang (Online / Offline Hybrid)
함께하는 행사 : ASML TechTalk (Nov. 19, 2021)
Session Track
Full Program
November 18(Thu)
PL-II
Plenary Session II
평창홀,
10:00-11:30 KST
좌장: 이상설(포항공대 가속기연구소)
온라인 발표장 바로가기 (Live Presentation)
PL-II-1
EUV-IUCC 센터장/프로그램위원장 환영사
*안진호 (한양대)
PL-II-2
Extending semiconductor patterning into the next decade
*Michael Lercel (ASML)
Abstract
PL-II-3
3 decades in lithography – the ever moving brick wall
*Bernd Geh (Carl-Zeiss)
Abstract