2021 차세대 리소그래피 학술대회

2021 Next Generation Lithography Conference

Nov. 17-18, 2021
Alpensia Convention Center, Pyeong Chang (Online / Offline Hybrid)
함께하는 행사 : ASML TechTalk (Nov. 19, 2021)
Session Track
Full Program
PS2
Patterning Materials

PS2-1
Highly Fluorinated Alternating Copolymers as EUV Resist Candidates
구예진, *이진균 (인하대학교), 정병준 (서울시립대학교), 이상설 (포항가속기연구소)
Abstract Presentation Video Q&A (1)