2021 차세대 리소그래피 학술대회

2021 Next Generation Lithography Conference

Nov. 17-18, 2021
Alpensia Convention Center, Pyeong Chang (Online / Offline Hybrid)
함께하는 행사 : ASML TechTalk (Nov. 19, 2021)
Session Track
Full Program
PS3
Nano Fabrication for Next Generation Optical Devices

PS3-1
Fabrication of nanoring array by angle E-beam evaporation and ICP-RIE
이기중, *신용범 (한국생명공학연구원)
Abstract Presentation Video Q&A
PS3-2
Wafer-scale large-area fabrication for multi-sized nano-disk-array visible camouflage IR stealth MSM meta-surface device by BARC-based DUV-lithography-compatible oxygen dry-etch lift-off method
Jookwon Song, *Jaewon Hahn (연세대학교)
Abstract Presentation Video Q&A (1)
PS3-3
Metal-Semiconductor-Metal Metasurface for the Multispectral Camouflage from Visible to Infrared Range
김자경, 박창훈, *한재원 (연세대학교)
Abstract Presentation Video Q&A