2021 차세대 리소그래피 학술대회

2021 Next Generation Lithography Conference

Nov. 17-18, 2021
Alpensia Convention Center, Pyeong Chang (Online / Offline Hybrid)
함께하는 행사 : ASML TechTalk (Nov. 19, 2021)
Session Track
Full Program
PS9
Advanced Etch Technology

PS9-1
Radial plasma profile modification of VHF/LF 2f-CCP dry etchers by electrode geometric design variation 
Jae Been LEE, *Jung hoon JOO (군산대학교)
Abstract Presentation Video Q&A