2021 차세대 리소그래피 학술대회

2021 Next Generation Lithography Conference

Nov. 17-18, 2021
Alpensia Convention Center, Pyeong Chang (Online / Offline Hybrid)
함께하는 행사 : ASML TechTalk (Nov. 19, 2021)
Session Track
Full Program
November 18(Thu)
T-PM-II
Patterning Materials II
평창홀 1,
14:50~16:50 KST
좌장: 김명웅(인하대)
온라인 발표장 바로가기 (Live Presentation)
T-PM-II-1
14:50~15:20
ArF Immersion exposure interference pattern analysis and application
*Jungchul Song (National NanoFab Center)
Abstract
T-PM-II-2
15:20~15:50
불소화 유기소재 기반 극자외선 레지스트 개발 연구
*이진균 (인하대학교), 이상설 (포항공대 가속기연구소), 정병준 (서울시립대학교)
Abstract
T-PM-II-3
15:50~16:05
Perfect optical Fourier surfaces through holographic inscription
임용준, 강병수, 홍승재, 손희주, 방준하, *이승우 (고려대학교)
Abstract
T-PM-II-4
16:05~16:20
Stable and highly efficient HOEs by using organic-inorganic hybrid interpenetrating networks
김광진, 양대겸, *이승우 (고려대학교)
Abstract
T-PM-II-5
16:20~16:35
Alignment Methods of Liquid Crystal Elastomers and Their Actuations
손희주, *이승우 (고려대학교)
Abstract
T-PM-II-6
16:35~16:50
Fabrication of 3D Nanostructured NiMo Electrocatalysts for the Hydrogen Evolution Reaction in Alkaline Solution
Kisun Kim, Anand P. Tiwari, *Seokwoo Jeon (한국과학기술원)
Abstract